New ion doping equipment that enables implants up to 300°C can eliminate or reduce higher temperature anneal steps later in the process. Temperature control gives panel makers more flexibility when doping both LTPS and oxide TFTs.
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Display Dynamics – December 2024: Hot Implant technology enhances performance of ion doping and expands its use in display manufacturing
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The Analyst Team
Charles Annis
Follow AnalystPractice Leader, Display Manufacturing, Technology, Components & Cost
Charles Annis leads the manufacturing, technology, components, and cost team within Omdia’s flat panel display research group. He is responsible for analyzing emerging technologies, tracking capacity, forecasting investments, and researching equipment, materials, and process trends.
Annis is the primary contributor and editor of the AMOLED and LCD Supply Demand & Equipment Intelligence Service, has authored numerous technology and market reports, and has conducted hundreds of consulting projects.
He has worked continuously as a display analyst since 2003 at multiple companies that have now all been integrated into Omdia. Before that, he served as strategic marketing manager at Photon Dynamics (now Orbotech) and as business development manager for SAMCO International.
Annis holds a master's degree in business law from Ryukoku University in Kyoto, Japan, and a bachelor's degree from Pomona College in Claremont, California, US.
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